NAVIGATION
- Inert Gas GLovebox
- Gas purification systems
- Glovebox Industry applications&Solutions
- Feedthroughs & Viewports
- Glovebox Accessories
- Plasma/UV-Zone Cleaners
- Ultrasonics/Water Circulator
- Film Coating
- Electronic Packages
- Battery R&D Equipment
- R2R Flexible Electronics Printing
LATEST NEWS
- Made in Space – 1st ISS 3D Printer
- M-Braun Glovebox System Operation Procedur
- Stainless steel glove box
- NREL test helps make moisture barriers bet
- Organic/inorganic sulfur may be key for sa
- Grant supports development of next-generat
CONTACT US
- Add: RM 1802B-A6 Fortress Tower 250 Kings RD North Point HongKong
- Tel: +86 010 8499 8901
- Fax: +86 010 8499 8901
- Email: adahan@foxmail.com
ONLINE STORE
UV-Ozone Cleaner YD-UV-22C
- Product description: UV-Ozone Cleaner YD-UV-22C
Product introduction
Overview
YD-UV-22C is a desktop Ultraviolet (UV) Ozone cleaner with substrate heater, which is used for cleaning all types of substrates to achieve better thin film quality at low cost. Also, it is an excellent tool to remove and strip photoresist, improve surface wettability, Clean SEM & TEM samples, UV polymer activation, assembly etc.UV-Ozone Cleaner has proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.
Product description
Main features |
1、The distance between sample stage and lamp is adjustable from 20mm to 40mm. 2、UV lamp service life: 5000 hrs. |
|
Technical parameters |
UV light area |
20cm×20cm(8") |
Lamp material |
Solid metal double wave mercury lamp |
|
Light Power |
250W |
|
Wave Length |
253.7nm and 184.9nm |
|
UV lamp service life |
5000h |
|
Structure |
Stainless steel case |
|
Power |
220V/50Hz |
|
Exhaust system |
Ozone exhaust systems |
|
Safety protection |
Automatic Operation protection function |
|
Net Weight |
62 lbs |
|
Application |
· Clean silicon wafer, Gallium Arsenide wafer, quartz and ITO glass · Clean all types of oxide single crystal substrate such sapphire, STO,and LAO. · Clean gold and Pt surface · Oxidizing surface of light metallic material · Activate Polymers and Crosslink Polymers · UV Strip Photo Resist / Photoresist · UV Clean Production Line LED displays |